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Chemical vapor deposition microelectromechanical systems

MEMS (microelectromechanical systems) are systems with small device sizes of 1-100 pm. They are typically driven by electrical signals. To fabricate such systems materials like semiconductors, metals, and polymers are commonly used. MEMS technology fabrication is very cost-efficient. The structures are transferred by processes, which are applied to many systems on one substrate or even many of them simultaneously. The most important fabrication processes are physical vapor deposition (PVD), chemical vapor deposition (CVD), lithography, wet chemical etching, and dry etching. Typical examples for MEMS are pressure, acceleration, and gyro sensors [28,29], DLPs [30], ink jets [31], compasses [32], and also (bio)medical devices. [Pg.443]


See other pages where Chemical vapor deposition microelectromechanical systems is mentioned: [Pg.379]    [Pg.3059]    [Pg.2126]    [Pg.50]    [Pg.389]   
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