Chemical vapor deposition , carbon monoliths

Chemical vapor deposition (C VD) is a versatile process suitable for the manufacturing of coatings, powders, fibers, and monolithic components. With CVD, it is possible to produce most metals, many nonmetallic elements such as carbon and silicon as well as a large number of compounds including carbides, nitrides, oxides, intermetallics, and many others. This technology is now an essential factor in the manufacture of semiconductors and other electronic components, in the coating of tools, bearings, and other wear-resistant parts and in many optical, optoelectronic and corrosion applications. The market for CVD products in the U.S. and abroad is expected to reach several billions dollars by the end of the century. 

For applications where high surface area is not important, the ceramic foam may be loaded ndi catalytic agents through single or multiple impregnation of suitable salts, followed Iw heat-treatment at moderate temperatures. Alternatively, a washcoat may be added with the same procedures used for monolithic substrates [20]. Surface areas increase from less than 1 mV to above 30 mV depending on the amount of washcoat added. In Ais way, washcoated foams have been loaded with metals and oxides [18,19], zeolites [20] and carbon [21]. Other methods, e.g. chemical vapor deposition, have also been su ested [23,24]. 

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