Chemical Fluid Deposition CFD

Chemical extractants, 10 750 Chemical fiber modification, 16 14 Chemical finishing, of fibers, 11 180-181 Chemical fluid deposition (CFD), of metals, 24 22... 

Chemical fluid deposition (CFD) [47] has been used to deposit metal films from non-volatile precursors equivalent volatile precursors for conventional CVD do exist, but the CFD approach broadens the range of available precursors and allows deposition at lower temperatures. 

Specific physicochemical properties of the supercritical fluids offer flexible alternatives to established processes like chemical vapor deposition (CVD), which is used in the preparation of high-quality metal and semiconductor thin films on solid surfaces. Watkins et al. [43] reported a method named chemical fluid deposition (CFD) for the deposition of CVD-quality platinum metal films on silicon wafers and polymer substrates. The process proceeds through hydrogenolysis of dimethyl-(cyclooctadiene)platinum(ll) at 353 K and 155 bar. 

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