Chemical amplification positive resists based on deprotection

3 Chemical amplification positive resists based on deprotection [Pg.343]

The main resist polymer platforms used in this form of chemical amplification comprise poly(hydroxy styrene), acrylate, alicyclic, and hybrid acrylate-alicyclic systems. Because of the great versatility of polyhydroxystyrene (PHOST) in [Pg.343]

Reiser, Photoreactive Polymers The Science and Technology of Resists, p. 278, John Wiley Sons, Hoboken, NJ (1989). [Pg.343]

226t Yamaokoa, N. Nishiki, K. Koseki, and M. Koshiha, A novel positive resist for deep UV litho graphy, Polym. Eng. Sci. 29, 856 (1989) M. Murata, T. Takahashi, M. Koshiha, S. Kawamura, and T. Yamaoka, Aqueous base developable novel deep UV resist for KrF excimer laser lithography, Proc. SPIE 1262, 8 (1990). [Pg.344]

2 Carbonate-protected chemical amplification resiste 7.2.2.3.2.1 Poly(hydroxystyrene) resist platform [Pg.346]

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