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Channeling spectrum, thin film

In order to improve the understanding of damage steps in spinel thin films, ion implantation with H+ and LF ions have been performed with fluences of 10, 10 , and 10 ions cm . The random RBS ion channeling spectra for the spinel Mgln204 thin films implanted with and LF ions are shown in Figure 9.6. A similar spectrum obtained from an unirradiated sample is also shown together for reference. [Pg.230]

P 12] A falling film micro reactor was applied for generating thin liquid films [6]. A reaction plate with 32 micro channels of channel width, depth and length of 600 pm, 300 pm and 66 mm, respectively, was used. Reaction plates made of pure nickel and iron were employed. The micro device was equipped with a quartz window transparent for the wavelength desired. A 1000 W xenon lamp was located in front of the window. The spectrum provided ranges from 190 to 2500 nm the maximum intensity of the lamp is given at about 800 nm. [Pg.613]


See other pages where Channeling spectrum, thin film is mentioned: [Pg.439]    [Pg.341]    [Pg.132]    [Pg.253]    [Pg.1578]    [Pg.961]    [Pg.440]    [Pg.248]    [Pg.124]    [Pg.320]    [Pg.100]    [Pg.105]    [Pg.309]    [Pg.1172]    [Pg.126]    [Pg.42]   


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