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Carrier density doping effect

Fig. 6.43. Variation of band gap Es measured on LP-CVD ZnO B films deposited at 155° C and 0.5mbar and with various doping levels, in function of the carrier density N. The dashed line and the full line are the predicted variations of Eg taking into account the Burstein-Moss effect alone, and both the Burstein-Moss and the band gap narrowing effects, respectively. Eo is the band gap of undoped ZnO and is set for the evaluation here to 3.3 eV. Reprinted with permission from [33]... Fig. 6.43. Variation of band gap Es measured on LP-CVD ZnO B films deposited at 155° C and 0.5mbar and with various doping levels, in function of the carrier density N. The dashed line and the full line are the predicted variations of Eg taking into account the Burstein-Moss effect alone, and both the Burstein-Moss and the band gap narrowing effects, respectively. Eo is the band gap of undoped ZnO and is set for the evaluation here to 3.3 eV. Reprinted with permission from [33]...
Again, with respect to the last two points, surface oxidation might result in effective charge-transfer doping even at room temperature and thereby enhancing the density of free carriers and the effective mobility. [Pg.554]

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See also in sourсe #XX -- [ Pg.5 ]



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