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Carbons vapour phase coatings

Apart from the reactions described above for the formation of thin films of metals and compounds by the use of a solid source of the material, a very important industrial application of vapour phase transport involves the preparation of gas mixtures at room temperature which are then submitted to thermal decomposition in a high temperature furnace to produce a thin film at this temperature. Many of the molecular species and reactions which were considered earlier are used in this procedure, and so the conclusions which were drawn regarding choice and optimal performance apply again. For example, instead of using a solid source to prepare refractory compounds, as in the case of silicon carbide discussed above, a similar reaction has been used to prepare titanium boride coatings on silicon carbide and hafnium diboride coatings on carbon by means of a gaseous input to the deposition furnace (Choy and Derby, 1993) (Shinavski and Diefendorf, 1993). [Pg.106]


See other pages where Carbons vapour phase coatings is mentioned: [Pg.106]    [Pg.2001]    [Pg.375]    [Pg.13]    [Pg.88]    [Pg.99]    [Pg.745]    [Pg.348]    [Pg.79]    [Pg.455]   
See also in sourсe #XX -- [ Pg.465 ]

See also in sourсe #XX -- [ Pg.465 , Pg.470 ]




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