Bronsted acid, generation mechanism from

Resist Chemistry. The basic chemistry of epoxy novolac based chemically amplified resists has been proposed in the past by Stewart et al. (9J. According to this the Bronsted acid generated either photochemically or through electron beam exposure from the onium salt induces acid catalysed polymerization of the epoxy functionality. This mechanism implies that the proton generated by the exposure is actually bound to the polymer. Since the lithography consequences of this mechanism are obvious we decided to seek possible experimental evidence for the proton binding in the resist film under conditions of lithographic interest. 

The product is exclusively carbon monoxide, and good turnover numbers are found in preparative-scale electrolysis. Analysis of the reaction orders in CO2 and AH suggests the mechanism depicted in Scheme 4.6. After generation of the iron(O) complex, the first step in the catalytic reaction is the formation of an adduct with one molecule of CO2. Only one form of the resulting complex is shown in the scheme. Other forms may result from the attack of CO2 on the porphyrin, since all the electronic density is not necessarily concentrated on the iron atom [an iron(I) anion radical and an iron(II) di-anion mesomeric forms may mix to some extent with the form shown in the scheme, in which all the electronic density is located on iron]. Addition of a weak Bronsted acid stabilizes the iron(II) carbene-like structure of the adduct, which then produces the carbon monoxide complex after elimination of a water molecule. The formation of carbon monoxide, which is the only electrolysis product, also appears in the cyclic voltammogram. The anodic peak 2a, corresponding to the reoxidation of iron(II) into iron(III) is indeed shifted toward a more negative value, 2a, as it is when CO is added to the solution. 

---