Bright-field mask

There are three ways in which ion beams are employed in lithography (see Fig. 15.8). A point beam can be focused to a fine spot ( 10 nm) from a bright point source and deflected on the surface, in an arrangement called focused ion beam (FIB), to expose the resist directly without a mask. " Two types of ion sources, liquid metal and gaseous (cryogenic) field ion source, have been successfully used in this technology. Of these two sources, liquid metal has... 

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