Benzophenone-2-sulfonyl chloride

For resists designed for applications in the near-UV region, good absorption at 365 nm (i-line) and at 405 nm and 436 nra (g-line) is required, and aromatic substituents present the best option. The most commonly used ballast compound is polyhydroxybenzophenone, where one to three (or even four) hydroxyl groups can be esterified with diazoquinone sulfonyl-chloride, as discussed above. A popularly used dissolution inhibitor is a substituted 2,3,4-trihydroxy benzophenone of stmcture (in), " where DQ stands here for diazonaphthoquinone. One other popular diazoquinone derivative found in commercial resists is the sulfonyl ester of cumylphenol. Similar materials such as shown in structure (IV) have also been employed in resist applications. ... 

Chloro-7-inethoxynaphthalene-1-sulfonyl chloride Benzophenone-3.3 -disulfonyl chloride... 

Obtained by ditosylation of 2,4,6-trihydroxy-3,5-diprenyl-benzophenone with p-toluene-sulfonyl chloride in the presence of potassium carbonate in refluxing acetone for 8 h (39%) [373]. 

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