Balance for Deposition in a Flow System

Total mass of monomer introduced into the system Total mass of deposition W2 Total mass exits from the reactor W3 Monomer-polymer conversion ratio  

The unit of normalized deposition rate is m, and normalized deposition rate decreases with the total surface on which deposition occurs. This aspect can be conceived as loading factor of luminous chemical vapor deposition (LCVD). Mass balance in a reactor (flow system) can be established as 

The material formation in LCVD generally requires the production of gaseous by-products, which do not form deposition, in order to create new chemical bonds for the material formation. For instance, LCVD of saturated hydrocarbons requires hydrogen abstraction in the dissociation glow. In presence of double and triple bonds, the hydrogen production becomes very small. 

Polymer yield, which is given by Fp= W2IW1, cannot be unity because of the gas formation for which gas yield can be defined by Yg = W3/W1. The value of Tp and Yg can be determined by measurement of pressure of a closed system, which is subjected to electrical discharge. If thus obtained Fp can be considered as a physicochemical parameter that is characteristic to a specific monomer. The average specific deposition rate can be expressed by 

Deposition rate = F (monomer characteristics, operational parameter, design factor) 

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