Ar, glow discharge

Similar detailed studies of RSFs have been carried out for GDMS, but not for electron-gun electron impact ionization or for SALI. The spread in elemental RSFs for electron-gas SNMS is comparable to that observed for Ar glow-discharge ionization of sputtered neutrals. ... 

Fig. 3.5. Silicon etch rate as measured with a quartz crystal microbalance as a function of the bias voltage applied to the silicon surface in CF4 and Ar glow discharges. The discharge intensity was not significantly influenced by the application of the negative voltage to the silicon surface...

The sputtering of metal from the electrode by Ar glow discharge depends primarily on the kinetic energy of the impinging ions. Therefore, it is easy to... 

Figure 1 Schematic of DC glow-discharge atomization and ionization processes. The sample is the cathode for a DC discharge in 1 Torr Ar. Ions accelerated across the cathode dark space onto the sample sputter surface atoms into the plasma (a). Atoms are ionized in collisions with metastable plasma atoms and with energetic plasma electrons. Atoms sputtered from the sample (cathode) diffuse through the plasma (b). Atoms ionized in the region of the cell exit aperture and passing through are taken into the mass spectrometer for analysis. The largest fraction condenses on the discharge cell (anode) wall.

Mass spectrometric studies of the ionic species which arrive at the cathode of both glow and corona discharges yield useful information regarding ion-molecule reactions which occur within these systems. Glow discharges have been used to study endothermic reactions, and their usefulness and limitations have been demonstrated by studies of the dissociative charge transfer reactions Ar+ + N2 N+ + N + Ar N2+ + N2 N+ + N + N2 N2+ + 02 0+ + O + N2. Exo-... 

Glow discharge ion source in Ar plasma Penning and e ionization plasma 3000-6000 ne 1015 cm-3 M+ low pressure double-focusing SFMS (reverse Nier-Johnson) traces, high-purity metals... 

This plasma detection method was also applied to detect a copper(II) ion solution (0.1 M) in a glass chip. Here, the liquid sample itself was employed as the cathode for the DC glow discharge, using Ar as the carrier gas [719]. 

Figure 9 Radio frequency glow discharge mass spectrometry (rf GD-MS) spectrum of a 1.5-mm-thick polytetrafluoroethylene (PTFE) sample (rf power = 20 W, Ar pressure = 0.075 mbar, logarithmic units of ion signal current). (From Ref. 70.)...

Figure 7 Glow discharge quadrupole ion trap mass spectra showing the dissociation of (a) the strongly bound (D° = 8.2 eV) TaO+ diatomic ion to form (b) Ta+ with nearly 100% efficiency on collision with background Ar (9.3 X 10 5 torr).

The simplest approach for the deposition of ZnO films by sputtering is sketched in Fig. 5.1 A DC glow discharge is ignited between a cathode, which is a planar Zn target, and the anode, which is the chamber of the vacuum system. The system is pumped to a pressure of T0Pa and Ar and O2 are introduced into the system. 

Fig. 5.1. Setup for glow discharge sputter deposition of ZnO by reactive DC sputtering of a metallic Zn target in an Ar/02 atmosphere...

---