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Applications of glow-discharge sampling in combination with spectrometries

Applications of glow-discharge sampling in combination with spectrometries [Pg.416]

Sputtering rates and penetration rates In order not to elaborate excessively on these concepts, this section deals only with the theoretical aspects in relation to pulsed GD sources. Interested readers are referred to the original references for more details. [Pg.417]

The sample sputtering rate, q (ng/pulse), occasionally referred to as the net sputtering rate — which recognizes the fact that the glow-discharge process involves redeposition effects — can be calculated from the following expression  [Pg.417]

Calibration curves Depth profiling entails running calibration curves. A variety of bulk reference standards are used for this purpose as the analyses require wide concentration ranges in different matrices. For example, when analysing a layered sample, the element [Pg.417]

Devices for treatment prior to introduction into atomic spectrometers [Pg.418]




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Application of samples

Glow

Glow discharge

Glow-discharge sampling

Glow-discharge sampling applications

Glow-discharge sampling with spectrometries

Glow-discharge spectrometry

Sample application

Sample applicator

Sample spectrometry

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