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Alternating phase-shifting masks

Furthermore, because chromium has proven difficult to dry etch, there have been considerable efforts expended in finding alternative mask opaque absorber materials. Molybdenum silicide (MoSi) appears to be gaining traction in certain applications, particularly in attenuated phase-shifting mask (att-PSM) and EUV mask applications (see Section 14.3), and even for binary masks. ... [Pg.627]

See other pages where Alternating phase-shifting masks is mentioned: [Pg.101]    [Pg.622]    [Pg.811]    [Pg.2702]    [Pg.2703]    [Pg.2705]    [Pg.101]    [Pg.622]    [Pg.811]    [Pg.2702]    [Pg.2703]    [Pg.2705]    [Pg.134]    [Pg.134]    [Pg.165]    [Pg.1064]    [Pg.3574]    [Pg.415]    [Pg.1064]    [Pg.144]    [Pg.44]    [Pg.266]    [Pg.238]    [Pg.332]   


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Alternating phase shift

Alternating phases

Phase shift

Phase-shifting

Phase-shifting masks

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