Alkali-developable silicon-containing

Alkali-developable silicon-containing positive photoresists, development, 175 Alkoxysilanes, polymerization,... 

The sodium condensation reaction of a,co-bis(chlorosilyl)-substituted compounds and the coupling reaction of dilithio derivatives of compounds bearing 7t-electron systems with dichlorosilanes offer a convenient route to various silicon containing polymers. However, the polymers prepared by these methods always contain a small proportion of siloxy units in the polymer backbone, which would interrapt the electron delocalisation. Therefore, new synthetic routes to organosilicon polymers have been developed in which no alkali metal halide condensations are involved [6, 7]. We report syntheses of organosilicon... 

The main problem in using the Hall process for silicon electrodeposition is that silicon melts at a much higher temperature than aluminum (1412°C compared to 660°C). Cryolite can not be used at this temperature due to volatization problems, so a binary or ternary melt containing SiOg had to be developed that would be stable above this temperature. Johnson (29) indicated that calcium and magnesium based silicate melts looked favorable, while other alkaline earth and alkali metal silicates were less desirable. 

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