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Alignment of block copolymer

Boker A et al (2002) Microscopic mechanisms of electric-field-induced alignment of block copolymer microdomains. Phys Rev Lett 89(13) 135502... [Pg.30]

As discussed below, the quality of the alignment (and even its direction in the case of lamellar morphology), is influenced by temperature, as well as the frequency and strain amplitude of the aligning shear field. No general theory for the alignment of block-copolymer phases has yet been developed. However, studies of a number of different block-copolymer systems show that in ordered states with cylindrical domains, shear orients the cylinders parallel to the flow, while for lamallar microdomains, two different shear-induced orientations are commonly found, depending on alignment conditions in both of these orientations, the flow direction lies in the plane of the lamellae. [Pg.610]

Wang H, Newstein MC, Krishnan A, Balsara NP, Garetz BA, Krishnamoorti BHR (1999) Ordering kinetics and alignment of block copolymer lamellae under shear flow. Macromolecules 32(11) 3695-3711... [Pg.37]

Thum-Albrecht, T., DeRouchey, J., Russell, T.P., Kolb, R. Pathways toward electric field induced alignment of block copolymers. Macromolecules 35, 8106 (2002)... [Pg.95]

T Thurn-Albrecht, J. DeRouchey, T. P. Russell, and R. Kolb, "Pathways Toward Electric Field Induced Alignment of Block Copolymers," Macromolecules. 35,8106-8110 (2002). [Pg.106]

D. Alignment of Block Copolymer Microstructure in an Electric Field—Experimental Studies... [Pg.1105]

Liedel C, Schindler RA, Pavan MJ, Lewin C, Pester CW, Ruppel M, Urban VS, Shenhar R, Boker A (2013) Electric-field-induced alignment of block copolymer/nanoparticle blends. Small 9... [Pg.385]

Alignment of Block Copolymer Morphologies under External Fields 30... [Pg.3]

The first reference to the alignment of block copolymer morphologies dates back to 1970. Since then, it has been a very aaive research topic in the block copolymer field. A very comprehensive review by Sakurai has been recently published. ... [Pg.31]

Figure 10 Schematics of directed self-assembly of block copolymers with a natural period of Pbcp on chemical patterns, (a) Chemical epitaxy based on dense chemical patterns of alternating preferential wetting stripe with a pitch of patterned substrate (Ls) close to Lo. The affinity between chemical patterns and block copolymer domains drives the self-alignment of block copolymer, (b) Sparse chemical patterns composed of alternating pinning stripes (width = 0.5io) and neutral stripes (width = Lk = Ls Lo) with a pitch which is twice the pitch of block copolymers (Ls/Lo 2). The self-assembled block copolymer doubles the spatial frequency of the underlying guiding chemical patterns. One domain of the block copolymers is selectively removed to show the self-assembled line-space patterns. Figure 10 Schematics of directed self-assembly of block copolymers with a natural period of Pbcp on chemical patterns, (a) Chemical epitaxy based on dense chemical patterns of alternating preferential wetting stripe with a pitch of patterned substrate (Ls) close to Lo. The affinity between chemical patterns and block copolymer domains drives the self-alignment of block copolymer, (b) Sparse chemical patterns composed of alternating pinning stripes (width = 0.5io) and neutral stripes (width = Lk = Ls Lo) with a pitch which is twice the pitch of block copolymers (Ls/Lo 2). The self-assembled block copolymer doubles the spatial frequency of the underlying guiding chemical patterns. One domain of the block copolymers is selectively removed to show the self-assembled line-space patterns.
Application of external fields such as electric fields and shear forces cause alignment of block copolymer morphologies, both in bulk and in thin films. Here, we describe the use of electric... [Pg.26]

Thin films under steady shear have been investigated for alignment of block copolymer thin films. Shear-induced alignment of spherical domains has also been demonstrated, though alignment only occurs for thicknesses with two or more layers of spheres. " " While spherical bilayers are not so useftil for templating applications, etching away the top layer reveals a more usefiil monolayer. " ... [Pg.27]

See other pages where Alignment of block copolymer is mentioned: [Pg.4]    [Pg.10]    [Pg.607]    [Pg.607]    [Pg.610]    [Pg.611]    [Pg.613]    [Pg.615]    [Pg.617]    [Pg.619]    [Pg.621]    [Pg.623]    [Pg.625]    [Pg.627]    [Pg.72]    [Pg.1097]    [Pg.762]    [Pg.386]    [Pg.229]    [Pg.31]    [Pg.31]    [Pg.29]   


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Rheology and Shear-Aligning of Block Copolymers

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