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Acid-catalyzed photoresist films

Bronsted Acid Generation from Triphenylsulfonium Salts in Acid-Catalyzed Photoresist Films... [Pg.27]

Acid-catalyzed photoresist films acid diffusion, 35 acid generation, 303233/341 advantages, 28 catalytic chain length, 3435r development of classes of cationic photoinitiators, 28 experimental procedure, 35-36 generation mechanism from irradiation of triphenylsulfonium salts, 28-29 merocyanine dye method for acid analysis, 30,31/33/... [Pg.438]

Acid Catalyzed Rearrangements. An example of a photoresist based on an acid catalyzed rearrangement is the diaryliodonium salt photoinduced cyclization of cis-1,4-polyisoprene shown in Equation 18. This facile cyclization which has been reported previously (11) by non-photochemical processes results in a polycyclic polymer whose physical properties and solubility characteristics are considerably different than the initial polymer. Exploitation of these differences in the exposed and unexposed regions of the polymer film permit their use as either positive or negative tone resists. [Pg.6]


See other pages where Acid-catalyzed photoresist films is mentioned: [Pg.438]    [Pg.438]    [Pg.27]    [Pg.98]    [Pg.238]    [Pg.819]    [Pg.306]    [Pg.764]    [Pg.316]    [Pg.46]    [Pg.494]    [Pg.354]    [Pg.175]    [Pg.51]   


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