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UV and Visible Absorptions of Symmetrically Trisubstituted Cyclopropenylium Ions

UV Characteristics of Selected Polymers and Conventional Stabilization Methods

UV Curable Coatings Formulations

UV Cure of ERL 4221 Using Various Triphenylsulfonium Salts

UV Cure Response, ift N-octanol

UV Cure Response, Trlol System

UV Cured Coatings Properties

UV curing activity, as determined by Koenig pendulum hardness, of a Ti02-pigmented polyester acrylate formulation in the presence of polymeric and low-molecular-weight initiators based on thioxanthone and hydroxypropiophenone moieties, as a taction of irradiation conditions

UV curing in film matrix of HDDA APDG and HDDA BA equimolar mixtures, under nitrogen, by photoinitiatois based on both benzophenone and tertiary amine moieties

UV curing in film matrix of HDDA BA equimolar mixture, under nitrogen, by poly s

UV curing in film matrix of HDDA BA equimolar mixture, under nitrogen, by polymeric and low-molecular-weight photoinitiators based on the acyldiphenylphosphinoxide moiety

UV curing in film matrix of HDDA BA equimolar mixture, under nitrogen, by polymeric photoinitiators bearing both benzophenone and tertiary amine moieties in the side chain

UV curing in film matrix of the HDDA APDG equimolar mixture, imder nitrogen, by low-and high-molecular-weight photoinitiators based on benzophenone moieties

UV curing in film matrix of the HDDA BA equimolar mixture, under nitrogen, by low- and high-molecular-weight photoinitiators based on cyclohexyl phenyl ketone moieties

UV curing in film matrix of the HDDA BA equimolar mixture, under nitrogen, by poly with the ethereal low-molecular-weight structural model IEE

UV curing in film matrix of the HDDA BA equimolar mixture, under nitrogen, by poly- and menthyl moieties

UV curing in film matrix of the HDDA BA equimolar mixture, under nitrogen, by polymeric and low-molecular-weight photoinitiators based on benzoin methyl ether moieties

UV curing in film matrix of the HDDA BA equimolar mixture, under nitrogen, by polymeric systems bearing the benzoin methyl ether moiety at different distances from the backbone, as compared with the corresponding low-molecular-weight analogues

UV curing in film matrix of the HDDA BA equimolar mixture, under nitrogen, by polymeric systems bearing the benzophenone moiety at different distance from the backbone as compared with low-molecular-weight analogues

UV curing in film matrix of UVE74 TEGDA mixture using polymeric phctoinitiators based on benzoin methyl ether and benzoin moieties and their low-molecular-weight analogues

UV curing of a Ti02-pigmented epoxyacrylate formulation in the air by polymeric and low-molecular-weight photoinitiators based on the acyldiphenylphosphinoxide moiety

UV curing, under nitrogen, of HDDA BA l

UV Cut-off Data

UV cut-off of high-quality organic solvents1

UV Data for Alcohol Soluble Portions of Degraded PC



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