X-ray photoelectron spectroscopy detectability

X-ray photoelectron spectroscopy detect changes in the states of atoms within a material and traditionally used to analyze content and chemical state of elements in thin surfaee layer. 

During adsorption of N2H4 on Fe(l 11), the tendency of dissociate is great. At 126 K ultra violet photoelectron spectroscopy shows the presence of N2H4 after 0.5 L exposure [550] condensation is detected at 80 L, 126 K [550]. At 220 K ultra violet photoelectron spectroscopy and X-ray photoelectron spectroscopy detect N2H4 and NH after 31 of exposure [550]. A 550 K N is formed during exposure [550]. 

The photoelectrons can come from all electronic levels but the electrons from the outermost electronic states have energies that are sensitive to the chemical bonding between atoms. Information on the chemical bonding can often be obtained from the photoelectron emission spectra by noting the chemical shifts of the XPS electron energy positions. For example, AES can detect carbon on a surface but it is difficult to determine the chemical state of the carbon. X-ray photoelectron spectroscopy detects the carbon and from the chemical shifts can tell if it is free carbon or carbon in the form of a metal carbide. 

---