Big Chemical Encyclopedia

Chemical substances, components, reactions, process design ...

Articles Figures Tables About

Very thin resists, lithography

Angelpoulos et al. [275,276] have reported a very interesting application of emeraldine base for lithography. Emeraldine base has been used as resists, and the authors used emeraldine base solution in NMP mixed with triphenyl sulphonium hexafluoro antimonate. This solution was used to spin-coat thin films on quartz and silicon wafers. On exposure to ultraviolet radiation of... [Pg.555]

See other pages where Very thin resists, lithography is mentioned: [Pg.761]    [Pg.268]    [Pg.474]    [Pg.3]    [Pg.175]    [Pg.282]    [Pg.1792]    [Pg.113]    [Pg.194]    [Pg.472]    [Pg.91]    [Pg.95]    [Pg.6232]    [Pg.238]    [Pg.125]    [Pg.409]    [Pg.330]    [Pg.528]    [Pg.599]    [Pg.17]    [Pg.383]    [Pg.446]    [Pg.244]    [Pg.276]    [Pg.215]    [Pg.122]    [Pg.201]    [Pg.431]    [Pg.144]    [Pg.97]    [Pg.6]    [Pg.241]    [Pg.130]   
See also in sourсe #XX -- [ Pg.2 ]



SEARCH



Very thin resists

© 2024 chempedia.info