Vacuum deposition

Apart from the techniques described in this chapter other methods of organic film fonnation are vacuum deposition or film fonnation by allowing a melt or a solution of the material to spread on the substrate and subsequently to solidify. Vacuum deposition is limited to molecules with a sufficiently high vapour pressure while a prerequisite for the latter is an even spreading of the solution or melt over the substrate, which depends on the nature of the intennolecular forces. This subject is of general relevance to the fonnation of organic films. 

Uosaki K, Shen Y and Kondo T 1995 Preparation of a highiy ordered Au(111) phase on a poiycrystaiiine goid substrate by vacuum deposition and its characterization by XRD, GiSXRD, STM/AFM and eiectrochemicai measurements J.Phys. Chem. 99 14 117-14 122... 

Pocza J F, Barna A and Barna P B 1969 Formation processes of vacuum deposited indium films and thermodynamical properties of submicroscopic particles observed by in situ electron microscopy J. Vac. Sc/. Techno . 6 472... 

Fabrication methods that are generaby used to make these junctions are diffusion, ion implantation, chemical vapor deposition (CVD), vacuum deposition, and bquid-phase deposition for homojunctions CVD, vacuum deposition, and bquid-phase deposition for heterojunctions and vacuum deposition for Schottky and MIS junctions. 

Optical Properties. The index of refraction and extinction coefficient of vacuum-deposited aluminum films have been reported (8,9) as have the total reflectance at various wavelengths and emissivity at various temperatures (10). Emissivity increases significantly as the thickness of the oxide film on aluminum increases and can be 70—80% for oxide films of 100 nm. 

L. Holland, Vacuum deposition of Thin Films, Chapman Hall, London, 1968. 

Acoustic Wave Sensors. Another emerging physical transduction technique involves the use of acoustic waves to detect the accumulation of species in or on a chemically sensitive film. This technique originated with the use of quartz resonators excited into thickness-shear resonance to monitor vacuum deposition of metals (11). The device is operated in an oscillator configuration. Changes in resonant frequency are simply related to the areal mass density accumulated on the crystal face. These sensors, often referred to as quartz crystal microbalances (QCMs), have been coated with chemically sensitive films to produce gas and vapor detectors (12), and have been operated in solution as Hquid-phase microbalances (13). A dual QCM that has one smooth surface and one textured surface can be used to measure both the density and viscosity of many Hquids in real time (14). 

Fig. 1. Vacuum deposition system having a plasma processing capabiHty, where the dashed lines represent optional additions to a system.

Vacuum Deposition. Vacuum deposition, sometimes called vacuum evaporation, is a PVD process in which the material is thermally vaporized from a source and reaches the substrate without coUision with gas molecules in the space between the source and substrate (1 3). The trajectory of the vaporized material is therefore line-of-sight. Typically, vacuum deposition takes place in the pressure range of 10 10 Pa (10 10 torr), depending on the level of contamination that can be tolerated in the resulting deposited film. Figure 3 depicts a simple vacuum deposition chamber using a resistively heated filament vaporization source. 

There are also disadvantages of vacuum deposition (/) many aUoy compositions and compounds can only be deposited with difficulty 2)... 

Thin films of photochromic glass containing silver haUde have been produced by simultaneous vacuum deposition of siUcon monoxide, lead siUcate, aluminum chloride, copper (I) chloride, and silver haUdes (9). Again, heat treatment (120°C for several hours) after vacuum deposition results in the formation of photochromic silver haUde crystaUites. Photochemical darkening and thermal fade rates are much slower than those of the standard dispersed systems. 

Amorphous (vitreous) selenium, vacuum-deposited on an aluminum substrate such as a dmm or a plate, was the first photoconductor commercially used in xerography (6). It is highly photosensitive, but only to blue light (2). Its light absorption falls off rather rapidly above 550 nm. Because of the lack of photoresponse in the red or near infrared regions, selenium photoreceptors caimot be used in laser printers having He—Ne lasers (632.8 nm), or soHd-state lasers (680—830 nm). 

L. Holland. Vacuum Deposition of Thin Films, Chapman and Hall, London (1966) TS 695 H6. J.P. Hii th and M. Pound. Condensation and Evaporation, Pergamon Piess New York (1963). J.M. Howe. Intetfaces in Materials, J. Wiley and Sons, New York (1997) QC 173.4.157 H68. A.V. Goldstein (ed.). Handbook of Nanomaterials, Marcel Dekker, New York (1997) TA418.9. 

Polymer-metal fractal interfaces may result from processes such as vacuum deposition and chemical vapour deposition where metal atoms can diffuse con-... 

Vacuum Deposition-also vapor deposition or gas plating the deposition of metal coatings by means of precipitation (sometimes in vacuum) of metal vapor onto a treated surface. The vapor may be produced by thermal decomposition, cathode sputtering or evaporation of the molten metal in air or an inert gas. 

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