UV absorption properties of typical gases in lithographic exposure tools

1 UV absorption properties of typical gases in lithographic exposure tools 

The absorption coefficient of oxygen at 193.1 nm was reported to be 0.0186 cm atm while the quantum yield of ozone formation at 193.1 nm by decomposition of excited oxygen molecules was reported to be 0.3 between 300 and 1300 torr. The low bond strength of ozone and its large absorption 

Okoroanyanwu, P. Kunze, K. A1 Shamery, J. Romero, and J. Bernard, Impact of photoinduced species in O2 containing gases on lithographic patterning at 193 nm wavelength, Proc. SPIE 4691, 746 (2002). 

Washida, Y. Mori, and I. Tanaka, Quantum yield of ozone formation from photolysis of the oxygen molecule at 1849 and 1931 A, J. Chem. Phys. 54(3), 1119 1122 (1970). 

Molecular acids Fluorides, chlorides, bromides, sulfates, phosphates, nitrogen/oxygen compounds Etch chambers, diffusion furnaces, CVD processes, buffered oxide etch, wet benches using HCl, HF Forms haze crystals on reticles, wafers, and exposure tool optical elements, causes corrosion of A1 and Cu metal lines 

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