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UV Absorption Bands of Semiconductor Oxides

two adsorption coefficients must be considered [53], one (tta) for the process with phonon absorption  [Pg.66]

Since both phonon and emission absorption are possible when hv Eg + Bp, the absorphon coefficient is then [Pg.67]

For each type/family of semiconductor oxide the value of Eg is related to significant dimensional, structural and/or functional properties, and so the features of the ophcal absorption edge is a source of relevant insight into such materials. [Pg.67]

As for the funchonal properties directly dependent on the optical absorption edge, a special place is held by the photocatalytic behavior of titania [49, 50]. In this respect, the determination of Eg of Ti02 materials by electronic spectroscopy data is of great interest. This allows assessment of the effectiveness of treatment/ preparation methods intended to decrease the wide Eg (3.2 eV for the anatase form, usually the most active photocatalyticaUy). This is of interest in the quest for visible [Pg.67]

Figu re 2.8 Plot of a against E hv) panel (A) as from equations and panel (B) forTi02 colloidal particles (three samples 2.1, 13.3 or26.7nm) suspended in an aqueous medium (15gL ). Panel (A) adapted from ref [26] panel (B) reprinted with permission from ref [54]. Copyright 1995 American Chemical Society. [Pg.67]


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Band of absorption

Of semiconductor bands

Oxidation bands

Oxide semiconductors

Semiconductor oxidic

UV absorption

UV absorption bands

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