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Triethoxysilyl alkoxyamines

LB reactive deposition was also employed for anchoring of triethoxysilyl alkoxyamine derivatives of TEMPO 8, SGI 9, and TIPNO 10 nitroxides to silicon substrates (Scheme 7) [17]. The nitroxide polarity and, therefore, the behavior of the corresponding alkoxyamine at the air-water interface of the LB trough had a... [Pg.9]

Scheme 7 Triethoxysilyl alkoxyamines derivatives of TEMPO 8, SGI 9, and TIPNO 10... Scheme 7 Triethoxysilyl alkoxyamines derivatives of TEMPO 8, SGI 9, and TIPNO 10...
See other pages where Triethoxysilyl alkoxyamines is mentioned: [Pg.215]    [Pg.127]   
See also in sourсe #XX -- [ Pg.8 ]



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