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Thin film multilayer systems deposition conditions

At low overpotentials nucleation of the Ni deposit starts at the elbows of the reconstruction (Fig. 4(b)), followed by anisotropic growth of monolayer islands perpendictilar to the double rows of the reconstruction (Fig. 4(c)). For multilayer coverages a layer-by-layer growth of the Ni thin film was observed up to thicknesses of six layers. Under UHV conditions, this system exhibits a similar nucleation behavior but the subsequent growth proceeds isotropically and in a more three-dimensional fashion [27]. Both in UHV and in file electrochemical environment the nucleation of islands is preceded by the formation of dqiressions at the elbows. This indicates that Au surface atoms at these sites are replaced by Ni atoms, which subsequently act as centers for adlayer island nucleation [28]. Ihis demonstrates r-reaching mechanistic similarities for deposition at the metal-vacuum and the metal-electrolyte interface, even in complex cases. [Pg.166]


See other pages where Thin film multilayer systems deposition conditions is mentioned: [Pg.513]    [Pg.287]    [Pg.93]    [Pg.454]    [Pg.765]    [Pg.63]    [Pg.205]    [Pg.397]    [Pg.531]    [Pg.249]   
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