The Principle of OVPD

In 1995 Forrest introduced the dry OVPD principle and has since investigated the benefits of gas-phase transport by using a simple flow reactor to overcome many 

Using a carrier gas in OVPD enables the deposition of organic materials at a controlled pressure of 10 3-10 torr. Thus the OVPD module does not have to be pumped down to high-vacuum conditions, as in VTE, which consequently increases the uptime of the OVPD deposition system. Also, the continuous purge of carrier gas in OVPD prevents any contamination of parasitic surfaces, which increases the reproducibility of the deposited organic film quality. Therefore Forrest envisaged with the flow deposition module that OVPD is an ideal solution for industrial mass production. 

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