Subject fabrication technology

Excellent treatment of this subject has been provided elsewhere. See, for example, S. Nonogaki, T. Ueno, and T. Ito, Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology, Chapter 5, Marcel Dekker, New York (1998). Here we emphasize only the key facts. A.G. Emslie, F.T. Bonner, and L.G. Peck, Flow of a viscous liquid on a rotating disk, J. Appl. Phys. 29, 858 862 (1958). 

The rapid development of solid state physics and technology during the last fifteen years has resulted in intensive studies of the application of plasma to thin film preparation and crystal growth The subjects included the use of the well known sputtering technique, chemical vapour deposition ( CVD ) of the solid in the plasma, as well as the direct oxidation and nitridation of solid surfaces by the plasma. The latter process, called plasma anodization 10, has found application in the preparation of thin oxide films of metals and semiconductors. One interesting use of this technique is the fabrication of complementary MOS devices11. Thin films of oxides, nitrides and organic polymers can also be prepared by plasma CVD. 

The extensive subject of damage analysis of textiles can be divided into typical cases of damage depending on the stage of processing or the technology of yam and fabric production such as ... 

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