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Strontium chemical vapor deposition

Fell, W. A., Wessels, B., Tonge, L., and Marks, T., Chemically Vapor Deposited Strontium Titanate Thin Films and Their Properties, Proc. 11th. Int. Conf. on CVD, (K. Spear and G. Cullens, eds.), pp. 148-154, Electrochem. Soc., Pennington, NJ 08534(1990)... [Pg.402]

Calcium- and strontium fluoride [3] each serve as components in fluoride glasses and have been used as insulators on GaAs. Photoassisted CVD utilizing calcium hexafluoroacetylacetonate (Ca(hfac)2 hfac 3) as a precursor molecule at a substrate temperature of 350°C yields polycrystalline layers of Cap2 [3]. Another source which has been used for the chemical vapor deposition of Cap2 is calcium trifluoroacetylace-tonate (Ca(tfac)2 tfac 3) [3]. [Pg.369]

See other pages where Strontium chemical vapor deposition is mentioned: [Pg.137]    [Pg.321]    [Pg.68]    [Pg.984]    [Pg.195]    [Pg.96]    [Pg.65]    [Pg.3439]    [Pg.201]    [Pg.137]    [Pg.272]    [Pg.3440]    [Pg.610]    [Pg.126]    [Pg.533]   


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Chemical vapor deposition

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