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Stencils chemical etching

In etching technology, where a surface resist stencil is produced from photoresist imaging, screen stencil, or maskant cutting, chemical attack can occur into the body of the substrate, and once a sidewall has been formed, the etchant can attack beneath the stencil to form what is known as undercut (U) where U = 0.5 (B-A) (see Fig. 2). Normally the etch factor (DAJ) is required to be as high as possible so that smaller holes can be etched into thicker materials. [Pg.485]


See other pages where Stencils chemical etching is mentioned: [Pg.176]    [Pg.213]    [Pg.1932]    [Pg.213]    [Pg.256]    [Pg.1163]    [Pg.21]    [Pg.141]    [Pg.530]    [Pg.130]    [Pg.136]    [Pg.232]   
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