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Single-Wafer Spin Cleaner

2 Single-Wafer Spin Cleaner Another type of single-wafer cleaning involves a spinning wafer next to a megasonic transducer as shown in Fig. 16.3. [Pg.469]

FIGURE 16.2 Triple transducer megasonic single-wafer cleaning system (from Ref. 2). [Pg.470]

FIGURE 16.4 Mechanism of cavitation in the ultrasonic cleaning process (from Ref. 4). [Pg.471]

FIGURE 16.5 Boundary layer thickness as a function of acoustic frequency. [Pg.472]


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