Siloxy aluminum hydrides

Single-Source-Precursor CVD Alkoxy and Siloxy Aluminum Hydrides... 

The third contribution is particularly devoted to the concept of so-called single source precursors (SSPs). SSPs contain all the atoms of the different elements necessary for the deposition of the desired material in one single molecule. One motivation for using this concept is to simplify the accompanying gas-phase reactions and thus reduce the process parameters to be controlled and optimised. However, SSPs may offer a unique chance of depositing metastable materials that cannot be derived by other methods. M. Veith and S. Mathur provide such an example in their paper entitled Single-Source-Precursor CVD Alkoxy and Siloxy Aluminum Hydrides . 

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