Si Atom Insertion—the Co-Condensation Method

As mentioned in Section II.2, Skell and Owen have produced silylenes through Si atom insertion reactions by the co-condensation of thermally produced silicon vapor with methylsilanes. The molecules they employed are 

Disproportionation Involving Silicon—The High-Temperature Reaction Method 

As mentioned in Section III.6, disproportionation between silicon and SiX4 molecules at high temperatures generates halogenated silylenes, SiX2. In practice, this type of reaction has been extensively employed in the formation of SiFj, as shown in equation (16). The chemistry of the difluorosilylene thus formed likely represents the most comprehensive study of all the known silylenes. 

The studies on the reactions of SiF2 formed by this high-temperature method have been thoroughly reviewed in a number of articles by Margrave and by Timms.  

---