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Self-aligned silicide

The salicide concept (self-aligned silicide) is now used extensively in MOSFET devices. It is based on TiSi2 and CoSi2, both of which are deposited by CVD.l k l The CVD reactions for the deposition of silicides are described in Ch. 12. [Pg.372]

See other pages where Self-aligned silicide is mentioned: [Pg.175]    [Pg.1]    [Pg.593]    [Pg.175]    [Pg.1]    [Pg.593]    [Pg.341]   
See also in sourсe #XX -- [ Pg.218 ]



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