Scanning electron micrograph of negative images

Figure 12. Scanning electron micrograph of negative images delineated in poly(TBMA-co-ST) resist at 7.6 mJ/cm2 of 254 nm radiation.

Figure 10. Scanning electron micrographs of negative images obtained by surface modification method using (a) 1, (b) 2b and (c) 4.

Figure 5. Scanning electron micrograph of negative images projection-printed at 0.4 mJ/cm of 248 nm radiation in preliminary tertiary alcohol resist containing...

Figure 10. Scanning electron micrographs of negative tone images before (left) and after (right) heating in air at 200 C. for 30 min.

Figure 10. Scanning electron micrographs of positive (top, 3.5 mJ/cm2) and negative images (bottom, 3.0 mJ/cm2) heated at 200°C for 30 min (the positive image was re-exposed to 2.8 mJ/cm2 of 254 nm radiation and baked at 130 C for 2 min prior to the 200°C bake).

Fig. 13 Scanning electron micrographs of positive (top) and negative (bottom) images delineated in fBOC resist by X-ray irradiation [15,16]...

Figure 6. Scanning electron micrographs of the negative image printed in the systems consisting of 1 (a) and 2 (b).

Fig. 8. Scanning electron micrographs (zoom-in) of a sample with sputter deposited ZnO (material A) and sputter deposited CU2O (material B), processed using negative photoresist and wet-chemical etching. The point-wise contacts (circled in the right image) had a density of approximately one per 10 pm of interface length.

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