RF Magnetron Discharges

A schematic of the RF magnetron used for ion etching (Okano, Yamazaki, Horiike, 

Non-Thermal Inductively Coupled RF Discharges in Cylindrical Coil 

Consider the indnctive RF discharge in a long cylindrical tnbe placed inside of the cylindrical coil. The physical properties of snch a discharge are similar to those of the planar one which is more convenient for applications. Electric field E r) induced inthe discharge tnbe located inside of the long coil is 

If pressnre is very low and plasma can be considered collisionless, its conductivity is inductive  

The skin layer is inversely proportional to the electric current in the indnctor coil. Taking into acconnt (4-104), the plasma density is proportional to the sqnare of the cnrrent in the indnctor coil  

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