Resolution of apparatus

The ability of apparatus to resolve two or more thermal events which occur in a close temperature range is important. In order to evaluate the resolution of various types of apparatus, it is recommended that the melting of a 4 1 mixture (by mass) of silica and potassium sulfate is measured. This composition gives two approximately equally sized peaks separated by about 11 °C. 

To provide a measure of the resolution of two peaks, the baseline separation method is used [8]. Tlie percentage resolution (/ ) is defined as 

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