Resist ketal-protected chemical

S Acetal- and ketal-protected chemical amplification resiste... 

Saito Y, Matsumoto K, Higashihara T, Ueda M. A chemically amphfied, negative-type photosensitive polyCphenylene ether ketone) (PEK) resist based on ketal-protected PEK and a photoacid generator. Chem Lett 2009 38(11) 1048-9. 

Acetals and ketals have attracted a great deal of attention recently as protecting groups of PHOST due to their lower activation energies of deprotection than fBOC and terf-butyl esters. While the majority of chemical amplification resists require PEB to accelerate acid-catalyzed reactions, deprotection of ac-... 

Since the introduction of chemically amplified resist systems to DUV technology, the environmental stability and bake latitudes have been the major concern of this type of chemistry. Ketal resist systems have been very robust towards fiiese issues. The methoxypropene protected polyhydroxystyrene resist is our first initial work on ketal system. 

---