Radio-Frequency Thermal Plasma CVD

Reaction conditions similar to those in the DC thermal plasma CVD can be obtained in an inductively coupled, radio-frequency induced thermal plasma at atmospheric pressure, as shown schematically in Fig, 2g. This technique was first reported by Matsumoto et al. in 1987.Very high 

In spite of the poor energy efficiency and difficult process control in both the DC thermal plasma CVD and the RF thermal plasma CVD, the high growth rates achieved with these methods represent a milestone in diamond CVD technology. Within less than a decade, deposition rates have been 

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