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Punch-Through Stop Implant

Fig. 14.6. Application of ion implantations in advanced CMOS structure at several stages of the process, (a) Ion implants for retrograde well formation, punch-through-stop, and threshold voltage adjust (b) shallow source/drain (S/D) implant and (c) halo implant... Fig. 14.6. Application of ion implantations in advanced CMOS structure at several stages of the process, (a) Ion implants for retrograde well formation, punch-through-stop, and threshold voltage adjust (b) shallow source/drain (S/D) implant and (c) halo implant...
See other pages where Punch-Through Stop Implant is mentioned: [Pg.203]    [Pg.203]    [Pg.206]    [Pg.203]    [Pg.203]    [Pg.206]    [Pg.203]    [Pg.203]    [Pg.206]    [Pg.203]    [Pg.203]    [Pg.206]    [Pg.199]    [Pg.199]   


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Punch

Punch-through-stop

Punching

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