Projection printing lasers

Dubroeucz, G. M. Zahorsky, D. "KrF Excimer Laser as a Future Deep UV Source for Projection Printing," International Conference on Microlithography, Grenoble, France, Oct. 1982. 

Figure 3.63. KrF excimer laser projection printing setup. Reproduced with permission from reference 212.)...

Figure 3.64. SEMs of 0.7- xm images projection printed with the experimental KrF excimer laser setup shown in Figure 3.63. (Reproduced with permission...

In the past, several photoresists were formulated for exposme at a visible wavelength,450 nm, using specialized exposure equipment—either visible lasers or magnified projection printing. More recently, laser direct imaging (LDI) based on the Ar+ laser ontpnt clnstered aronnd 360 nm has been commercialized. Conventional photoresists can be exposed on LDI eqnipment, bnt higher photospeed has been key to the productivity and economics of LDI. 

Figure 3.62. SEMs of 0.9-ym lines and spaces printed with a laser projection system in 0.7-ym-thick AZ1350H on a 0.5-pm oxide step (left) and 1.5-ym-thick AZ1350H on a i- xm aluminum step (right). Reproduced with permission from reference 211. Copyright 1980 Technical Publishing.)...

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