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Process monitoring/control technologies development

The next major advancements in MOCVD control system technology are likely to be in the area of feedback control. First and foremost is the incorporation of real time in-situ process monitors that directly provide feedback into the ongoing deposition process. Second, the development of software which converts a user defined structure to the run parameters for each layer of the structure however, this development appears to be several years away. [Pg.221]

See other pages where Process monitoring/control technologies development is mentioned: [Pg.200]    [Pg.110]    [Pg.74]    [Pg.116]    [Pg.738]    [Pg.143]    [Pg.449]    [Pg.522]    [Pg.540]    [Pg.261]    [Pg.506]    [Pg.332]    [Pg.74]    [Pg.281]    [Pg.242]    [Pg.315]    [Pg.171]    [Pg.71]    [Pg.719]    [Pg.3]    [Pg.109]    [Pg.13]    [Pg.321]    [Pg.165]    [Pg.751]    [Pg.10]    [Pg.214]    [Pg.281]    [Pg.187]    [Pg.266]    [Pg.23]    [Pg.252]    [Pg.671]    [Pg.121]    [Pg.392]    [Pg.181]    [Pg.947]    [Pg.32]    [Pg.322]    [Pg.947]    [Pg.248]    [Pg.55]    [Pg.64]    [Pg.168]    [Pg.341]    [Pg.348]    [Pg.7]    [Pg.4]    [Pg.696]   
See also in sourсe #XX -- [ Pg.377 ]



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Control technology

Development technology

Process control monitoring

Process control monitors

Process monitoring/control technologies

Process monitoring/control technologies controls

Process monitoring/control technologies processes

Technological developments

Technological process

Technology processability

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