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Polymethyl isopropenyl ketone

POLYMETHYL METHACRYLATE POLY T-BUTYL METHACRYLATE POLYMETHYL ISOPROPENYL KETONE CROSSLINKED POLYMETHYL METHACRYLATE POLY OLEFIN SULFONES POLY HEXYL ISOCYANATE DIAZOQUINONE PHOTORESIST... [Pg.119]

Since polymers with tetrasubsltuted centers are difficult to synthesize, two main types of positive resists have been dlsclosed. Polymethylmethacrylate r polymethyl Isopropenyl ketone hich undergo side chain elimination and subsequent main chain fracture have been used as positive electron beam resists (cf. [Pg.120]

See other pages where Polymethyl isopropenyl ketone is mentioned: [Pg.345]    [Pg.1005]    [Pg.345]    [Pg.1005]   
See also in sourсe #XX -- [ Pg.120 ]

See also in sourсe #XX -- [ Pg.120 ]



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Isopropenyl

Isopropenylation

Polymethylated

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