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Polymer resist, scanning electron micrograph

FIGURE 5.5.33 Scanning electron micrograph of polymer resist with 6-, 8.5-, and 17-nm halfpitch gratings fabricated by NIL. (From M. D. Austin et al, Nanotechnology, 16, 1058, 2005.)... [Pg.477]

Fig. 20. Examples of silicon-containing polymers for use in bilayer resist formulations. The top structure is used in a 248-rnn bilayer CA resist. The scanning electron micrograph shows the high aspect ratio images that can be obtained using 248-mn projection lithc a-phy with a bilayer resist based on this polymer. The bottom structure shows an example of a silicon-containing polymer designed for use in 193-nm lithography. Fig. 20. Examples of silicon-containing polymers for use in bilayer resist formulations. The top structure is used in a 248-rnn bilayer CA resist. The scanning electron micrograph shows the high aspect ratio images that can be obtained using 248-mn projection lithc a-phy with a bilayer resist based on this polymer. The bottom structure shows an example of a silicon-containing polymer designed for use in 193-nm lithography.
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Electron micrograph

Electron micrographs

Electron micrographs, scanning

Electron resistance

Electron resists

Electronic resistance

Electronic resistivity

Polymer electronics

Polymer micrograph

Polymer resistance

Polymer resists

Resist polymer

Scanning electron micrograph

Scanning electron micrographic

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