Plasma-Immersion Ion Implantation General Principles

Dynamics of Sheath Evolution in Plasma-Immersion Ion Implantation From Matrix Sheath to Child Law Sheath 

The sheath propagation velocity can then be found as a fimetion of its position 

Time evolution of the sheath, s t), can be found by integration of equation (8-107)  

Because the applied voltage is much higher than the electron temperature (Te eVo), the steady-state Child law sheath is much larger than the matrix sheath chAo (eVo/Te) / 1. Expansion of equation (8-110) for 5o 5 5ch gives the time evolution of the sheath thickness  

The time (8-113) for formation of the sheath usually exceeds the voltage pulse period 

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