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Photopolymerization, optical patterning

The nonlinear response of material to optical excitation is the main requirement for formation of 3D patterns by photopolymerization. The appU-cation potential of such patterns in microphotonic, photonic crystal, MEMS, and microlluidic appUcations is described in our contributions to [58]. [Pg.175]

See other pages where Photopolymerization, optical patterning is mentioned: [Pg.90]    [Pg.177]    [Pg.195]    [Pg.194]    [Pg.97]    [Pg.244]    [Pg.247]    [Pg.283]    [Pg.352]    [Pg.398]    [Pg.401]    [Pg.406]    [Pg.2818]    [Pg.197]    [Pg.5637]    [Pg.318]    [Pg.296]    [Pg.1705]    [Pg.177]    [Pg.724]    [Pg.167]    [Pg.211]    [Pg.246]   
See also in sourсe #XX -- [ Pg.90 ]



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Photopolymerization

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