Photolithography polymers

Figure 6.9 A schematic representation of orthogonal process for nanoparticles self-assembly (a) a patterned sihcon wafer with Thy-PS and PVMP polymers fabricated through photolithography and (b) orthogonal surface functionahzation through Thy-PS/DP-PS recognition and PVMP/acid-nanoparticle electrostatic interaction. Reprinted with permission from Xu et al. (2006). Copyright 2006 American Chemical Society.

Although these polymers have inadequate stability and processibility for most plastics applications, the ability to undeigo scission back to the gaseous monomers has afforded some utility in fabrication of electron-beam resists for photolithography. Polybutene sulfone (251) and polyhexene sulfone (252) have been developed for this small-volume but high value application. 

Fig. 6 Top A 4-in. silicon substrate with multiplexed MIPs. Features defining one chip are repeated on the entire wafer. Inset A, MIP templated with dansyl-L-Phe B, MIP templated with boc-L-Phe C, nonimprinted control polymer [75], Bottom Examples of MIP patterns obtained by photolithography. With this method, a wide variety of shapes is achieved with resolution down to 1.5 pm [75] Reproduced by permission of the Royal Society of Chemistry...

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