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Photochemical etching technology

Lu and Wang [48] have reported that by using stainless steel plates as bipolar plates (electrodes) with the flow field machined with photochemical etching technology a micro-DMFC produce maximum power density of 62.5 mW cm" at 40°C and 100 mW cm at 60°C at atmospheric pressure. The active electrode area is only 1.625 cm. The power generated by the stainless steel DMFC is double to that of the Si-based DMFC which the authors had previously fabricated. [Pg.170]

See other pages where Photochemical etching technology is mentioned: [Pg.127] [Pg.230] [Pg.592] [Pg.127] [Pg.230] [Pg.592] [Pg.621] [Pg.189] [Pg.136] [Pg.149] [Pg.56] [Pg.150] [Pg.135] [Pg.2124] [Pg.167] [Pg.2528] [Pg.2553] [Pg.323] [Pg.157] [Pg.572]

See also in sourсe #XX -- [ Pg.127 , Pg.170 ]

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Etching photochemical

Photochemical technology