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Photo-cleavable protecting group

Fig. 6.2.3. Photo-cleavable protecting groups used in light-directed synthesis of DNA chips. Fig. 6.2.3. Photo-cleavable protecting groups used in light-directed synthesis of DNA chips.
Kessler, M., Glatthar, R., Giese, B. and Bochet, C.G. (2003) Sequentially photo-cleavable protecting groups in solid-phase synthesis. Organic Letters, 5, 1179-1181. [Pg.442]

This group was developed as a photo-cleavable protective group with improved properties over the parent 2-nitrohenzyl group. It is cleaved hy photolysis at 380 nm in aqueous CH3CN in yields from 88-100%. ... [Pg.615]

See other pages where Photo-cleavable protecting group is mentioned: [Pg.187]    [Pg.249]    [Pg.249]    [Pg.187]    [Pg.249]    [Pg.249]    [Pg.72]    [Pg.418]    [Pg.63]    [Pg.210]    [Pg.215]    [Pg.249]    [Pg.249]    [Pg.286]    [Pg.169]    [Pg.68]   
See also in sourсe #XX -- [ Pg.492 ]



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Cleavability

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