Phenolic condensation, microlithography

I ovolac Synthesis and Properties. Novolac resins used in DNQ-based photoresists are the most complex, the best-studied, the most highly engineered, and the most widely used polymers in microlithography. Novolacs are condensation products of phenoHc monomers (typically cresols or other alkylated phenols) and formaldehyde, formed under acid catalysis. Figure 13 shows the polymerization chemistry and polymer stmcture formed in the step growth polymerization (31) of novolac resins. 

Co-condensation of phenolic compounds has gained importance in microlithography. Co-condensation of poly-4-hydroxystyrene and phenolics in the presence of methanal leads to products with the following stracture [157] ... 

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See also in sourсe #XX -- [ ]

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