Pattern formation, mesoscopic polymer

Maruyama, N., Koito, T, Sawadaishi, T, Karthaus, O., Ijiro, K., Nishi, N., Tokura, S., Nishimura, S. and Shimomura, M. (1998) Mesoscopic pattern formation of nanostructured polymer assemblies. Supramol. Sci., 5, 331-336. 

In order to expand the applicability of mesoscopic dot-, line- and honeycomb patterns in foe field of photonics and electronics, one promising approach is the incorporation of photofonctional low-molar-mass compoimds into the dewetted polymer patterns, or foe pattern formation of low molar rrtass compounds themselves. 

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